Experimental equipments
Katahira campusHigh-resolution ARPES system
(SES-2002)
(SES-2002)
Spin-resolved ARPES system with Mott detector (A-1)
Spin-resolved ARPES system with VLEED detector (A-1)
Gas cluster ion beam
system (GCIB)
system (GCIB)
MBE system for
Fe-based supercondctor film growth
Fe-based supercondctor film growth
MBE system for
Topological insulator film growth
Topological insulator film growth
MBE system for
TMD film growth
TMD film growth
Hydrogen etching system for semiconductors
CW extrem-ultraviolet laser source
Time-resolved pomp-probe laser source
Scanning tunneling microscopy (STM)
Glove box
Draft chamber
Degital microscope
Electric furnace
Wire bonder
3D printer
Welding machine
Polishing machine for single crystal
Graphene growth system
Diamond cutting system
High-resolution ARPES system
(SES-200)
(SES-200)
Atomic-force microsopy
(AFM)
(AFM)
High-resolution electron
energy loss spectroscopy (HR-EELS)
energy loss spectroscopy (HR-EELS)
High-vacuum/low-tempeture
polarizing microscope system
polarizing microscope system
Kerr microscopy system
Graphene growth system
Nano spin ARPES system
Combined MBE and Raman system
Micro-ARPES system
(BL-28A: Public Beamline)
(BL-28A: Public Beamline)
